Bisphenol F Low Viscosity Epoxy (EEW 158-168)
Key Features
- Lowest viscosity in bisphenol-based liquid epoxy range
- No reactive diluents needed — full chemical resistance retained
- Tg >180°C with DDS for aerospace applications
- Excellent purity for semiconductor and optical uses
- Does not crystallize at low temperatures
Bisphenol F Low Viscosity Epoxy (EEW 158-168 g/eq) is a premium-purity BPF epoxy produced with strict control of the monomer isomer ratio and minimal high-molecular-weight oligomers to achieve the lowest possible viscosity (1,500-3,000 mPa·s at 25°C) in the bisphenol-based liquid epoxy category. This grade achieves viscosity targets not attainable with standard BPF grades due to tighter molecular weight distribution.
The ultra-low viscosity enables use as the base resin in high-performance infusion epoxy systems and advanced composite laminating without reactive diluents, preserving the full chemical resistance and thermal performance of the BPF backbone. Hydrolyzable chloride ≤300 ppm and Gardner color ≤1 make it suitable for semiconductor encapsulation and optical applications.
With DDS (4,4'-diaminodiphenylsulfone) curing at 180°C/2h, Tg exceeds 180°C with excellent hot/wet mechanical property retention. This makes it a key component in aerospace structural composite systems where maximum Tg with manageable viscosity is required. Applications include aerospace prepreg resin systems, high-temperature composite tooling, advanced adhesive formulations, and semiconductor encapsulation.
Specifications
| Parameter | Value |
|---|---|
| Appearance | Water-white to very slightly yellow liquid |
| Color (Gardner) | ≤1 |
| Density (25°C) | 1.20-1.21 g/cm³ |
| Viscosity (25°C) | 1,500-3,000 mPa·s |
| Hydrolyzable Chloride | ≤300 ppm |
| Epoxy Equivalent Weight | 158-168 g/eq |
| Tg (DDS cured, 180°C/2h) | >180°C |
Applications
FAQ
For maximum Tg with DDS (4,4'-DDS, AHEW 62 g/eq): stoichiometric ratio = 62/163 × 100 = 38 phr DDS per 100g resin. Cure schedule: (1) 80°C/1h (dissolution/initial cure); (2) 120°C/1h; (3) 180°C/2h post-cure. This staged cure prevents thermal stress from rapid ramp to high temperature and achieves Tg >180°C. With 3,3'-DDS (AHEW 62 g/eq, faster), lower initial cure temperature (60°C) is required to avoid premature gelation before full dissolution.
Direct Contact
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